2013-08 至 2020-05，伊利诺伊大学厄巴纳-香槟分校，无机化学，博士（导师 Gregory S. Girolami)
博士论文：Metal Complexes with ω-Alkenyl Ligands. Synthesis, Structure, Reactivity, and Applications in Chemical Vapor Deposition (CVD) and Hydrosilylation Catalysis
2009-09 至 2013-06，南京大学，化学，学士

2020-07 至 2023-03，加州大学河滨分校，博士后（导师 Richard R. Schrock，2005年诺贝尔化学奖得主)
2023-07 至今 上海交通大学，suncitygroup太阳集团，助理教授

CVD/ALD前驱体开发（面向区域选择性沉积，高宽深比三维结构填充，超平导电薄膜等先进制造需求)

CVD/ALD前驱体构效关系研究

过渡金属无机化学和有机金属化学

其他应用型原子级制造技术

立足于用化学手段帮助解决先进制造领域（如：薄膜沉积/刻蚀，材料加工，表界面催化化学反应等）的真问题。

实际应用场景会带来工艺兼容性的束缚，这既是挑战也是机遇。

我们坚持用最简单、最兼容的手段去解决复杂的难题，希望有机会与工业界的朋友门多多交流合作。

1，新型氢化硅烷化催化剂（高达百万级TON）攻克硅胶交联低温可控引发难题，在兼容已有工艺的基础上抑制了商用催化剂常见的副反应（J. Am. Chem. Soc. 2021, 143, 17492，U.S. Patent 11253846，校企合作项目）

2，诠释OCT工艺（先进超高纯丙烯制备工艺）中催化活性中心生成机制50年未解之谜（ J. Am. Chem. Soc. 2021, 143, 17209）。

A world class result that will have significant repercussions.

                                                                                                 ——Richard R. Schrock

3，新CVD/ALD前驱体结构设计与成膜性质构效关系(Chem. Mater. 2020, 32, 9316，U.S. Patent 11,008,353)

加入上海交大之前：
1. Liu, S.; Girolami, G. S.*, Platinum(II) Di-ω-alkenyl Complexes as “Slow-Release” Precatalysts for Heat-Triggered Olefin Hydrosilylation. J. Am. Chem. Soc. 2021, 143, 17492-17509.
2. Liu, S.; Boudjelel, M.; Schrock, R. R.*; Conley, M. P.; Tsay, C., Interconversion of Molybdenum or Tungsten d2 Styrene Complexes with d0 1-Phenethylidene Analogues. J. Am. Chem. Soc. 2021, 143, 17209-17218.
3. Liu, S.; Zhang, Z.; Gray, D.; Zhu, L.; Abelson, J. R.; Girolami, G. S., Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors: Synthesis and Characterization of Pt[CH2CMe2CH2CH═CH2]2 and the Impact of Ligand Design on the Deposition Process. Chem. Mater. 2020, 32, 9316-9334.
4. Liu, S.; Schrock, R. R.*; Conley, M. P.; Carta, V. Formation of a Metathesis-Active Molybdenum Alkylidene from 1,7-Octadiene via Rearrangement of a Molybdabicyclopentane. Organometallics., 2023, 42, 2321-2325.

5. Liu, S.; Schrock, R. R.*; Conley, M. P.; Tsay, C., Carta, V. An Exploration of the Acid-Catalyzed Interconversion of Mo(NAr)(CR1R2)(OR)2 Complexes and Their Mo(NAr)(Olefin)(OR)2 Isomers (Ar = 2,6-i-Pr2C6H3, OR = OSiPh3 or OAr). Organometallics., 2023, 42, 2251-2261.
6. Liu, S.; Conley, M. P.; Schrock, R. R.* Synthesis of Mo(IV) para-Substituted Styrene Complexes and an Exploration of Their Conversion to 1-Phenethylidene Complexes. Organometallics., 2023, 42, 1087-1093.
7. Liu, S.; Smith, B. A.; Kirkland, J. K.; Vogiatzis, K. D.*; Girolami, G. S.*, Nature of the Short Rh–Li Contact between Lithium and the Rhodium ω-Alkenyl Complex [Rh(CH2CMe2CH2CH═CH2)2]−. Inorg. Chem. 2021, 60, 8790-8801.
8. Liu, S.; Girolami, G. S.*, Synthesis and Characterization of 2,2-Dimethylpent-4-en-1-yl Complexes of Rhodium and Iridium: Reversible Olefin Decomplexation and C–H Bond Activation. Organometallics 2021, 40, 714-724.
9. Liu, S.*; Girolami, G. S.*, Microscale Vacuum Distillation Apparatus for High-Boiling, Air- and Heat-Sensitive Liquids. Talanta 2021, 223, 121747.
10. Liu, S.; Zhang, Z.; Abelson, J. R.; Girolami, G. S.*, Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH═CH2]2 in Solution and the Origin of Rapid Nucleation. Organometallics 2020, 39, 3817-3829.
11. Liu, S., Gray D., Zhu L., and Girolami, G. S.*, Lithium–Olefin π-Complexes and the Mechanism of Carbolithiation: Synthesis, Solution Behavior, and Crystal Structure of (2,2-Dimethylpent-4-en-1-yl)lithium. Organometallics 2019, 38, 2199-2210. Featured in the cover of issue 12.
12. Liu, S.; Girolami, G. S.*, Tetrakis(dimethoxyboryl)methane, IUCrData 2016, 1, x161264.
13. Zhang, Z. V.; Liu, S.; Girolami, G. S.; Abelson, J. R.*, Selective Chemical Vapor Deposition of HfB2 on Al2O3 over SiO2 and the Acceleration of Nucleation on SiO2 by Pretreatment with Hf[N(CH3)2]4. J. Vac. Sci. Technol., A 2020, ASD2020, 023415.
14. Zhang, Z. V.; Liu, S.; Girolami, G. S.; Abelson, J. R.*, Ultrasmooth Cobalt Films on SiO2 by Chemical Vapor Deposition Using a Nucleation Promoter and a Growth Inhibitor. J. Vac. Sci. Technol., A 2020, ASD2020, 023414.
15. Zhang, Z. V.; Liu, S.; Girolami, G. S.; Abelson, J. R.*, Area-Selective Chemical Vapor Deposition of Cobalt from Dicobalt Octacarbonyl: Enhancement of Dielectric-Dielectric Selectivity by Adding a Coflow of NH3. J. Vac. Sci. Technol., A 2020, 38, 033401.
16. Mohimi, E., Zhang, Z. V., Mallek, J. L., Liu, S., Trinh, B. B., Shetty, P. P., Girolami, G. S., Abelson, J. R.*, Low Temperature Chemical Vapor Deposition of Superconducting Vanadium Nitride Thin Films. J. Vac. Sci. Technol., A. 2019, 37, 031509.
17. Mohimi, E., Canova, K.; Zhang, Z., Liu, S., Mallek, J. L., Girolami, G. S., Abelson, J. R.*, Low Temperature Chemical Vapor Deposition of Superconducting Molybdenum Carbonitride Thin Films. J. Vac. Sci. Technol., A. 2019, 37, 021503.
18. Mohimi, E., Zhang, Z., Liu, S., Mallek, J. L., Girolami, G. S., Abelson, J. R.*, Area Selective CVD of Metallic Films from Molybdenum, Iron, and Ruthenium Carbonyl Precursors: Use of Ammonia to Inhibit Nucleation on Oxide Surfaces. J. Vac. Sci. Technol., A. 2018, 36, 041507.
19. Talukdar, T. K., Liu, S., Zhang, Z., Harwath, F., Girolami, G. S., Abelson, J. R.*, Conformal MgO Film Grown at High Rate at Low Temperature by Forward-Directed Chemical Vapor Deposition. J. Vac. Sci. Technol., A. 2018, 36, 051504.
20. Elg, D. T.*, Panici, G. A., Liu, S., Girolami, G. S., Srivastava, S. N., Ruzic, D. N.* Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching. Plasma Chem. Plasma Process. 2018, 38, 223-245.

加入上海交大之前：
1. Girolami, G. S. and Liu, S.; “Metal Complexes for Depositing Films and Method of Making and Using the Same,” U.S. Patent 11,008,353 (Patented Mar. 14th, 2021);
2. Girolami, G. S. and Liu, S.; “Metal Complexes for Depositing Films and Method of Making and Using the Same,” U.S. Patent 11,253,846 (Patented Feb. 22nd, 2022); International application No. PCT/US2021/021746.
3. Abelson, J. R., Mohimi, E., Girolami, G. S., Liu, S., Zhang, Z.; “Area Selective CVD of Metallic Films Using Precursor Gases and Inhibitors,” U.S. Patent 11,584,986 (Patented Feb. 21st, 2023).